Technical information
Responsible: Harald Havir / André Anderssen
Location: Q 256
License and Booking Required: Yes
Tool Overview
- Main application: Deposition thin high-k oxide layers
- Materials: HfO, Al2O3
- 8" max wafer diameter
- 3 precursors currently installed:
- Hafnium (TDMAHf, Booster).
- Water.
- Aluminum (TMA)