There are a number of thin film systems available at Lund Nano Lab.
This includes:
- E-Beam evaporation
- Thermal evaporation
- Sputter
- Plasma enhanced chemical vapout deposition
- Atomic layer deposition
Below you find many of the different thin film tools available to LNL users.
By clicking on the tools you can access a lot of useful information, such as user manuals, available materials, and contact details for the tool responisible.
Introduction
Welcome... blah blah blah....
Chemical Deposition: Here, a fluid precursor undergoes a chemical change at a solid surface, leaving a solid layer. An everyday example is the formation of soot on a cool object when it is placed inside a flame. Since the fluid surrounds the solid object, deposition happens on every surface, with little regard to direction; thin films from chemical deposition techniques tend to be conformal, rather than directional.
Physical Deposition: Physical deposition uses mechanical, electromechanical or thermodynamic means to produce a thin film of solid. An everyday example is the formation of frost. Since most engineering materials are held together by relatively high energies, and chemical reactions are not used to store these energies, commercial physical deposition systems tend to require a low-pressure vapor environment to function properly; most can be classified as physical vapor deposition (PVD).Temescal E-Beam Evaporator
