Technical information
- Main application: Molecular Vapor Depostion tool for surface modification using self-assembled monolayers and atomic layer deposition.
- Materials: SiO2, HfO, TiN, Al2O3, AlN
- 8" max wafer diameter
Tool Overview
Responsible: Bengt Meuller/ Anders Kvennefors
Location: Room Q258, (Level 2)
License and Booking Required: Yes
Documentation