Responsible staff

EBL - Raith 150

EBL - Raith 150
Technical information
  • Acceleration Voltages: 5-30 kV.
  • Pattern generator speed: 10Mhz.
  • 6" Max sample size.
  • Minimum resolution: 10 nm.
  • Maximum probecurrent: 1nA
  • Equipped with thermal field emission cathode and laser interferometer stage.
Tool Overview
  • Responsible: Harald Havir / David Alcer
  • Location: Room Q156, EBL-Lab (Cleanroom Level 1)
  • License and Booking Required: Yes