Technical information
- Main application: Deposition thin high-k oxide layers
- Materials: HfO,ZrO, Al2O3
- 4" max wafer diameter
- Sample handling inside nitrogen filled glovebox environment to ensure interface quality and purity.
- 4 precursors currently installed:
- Zirconium (TEMAZr, Pico Booster).
- Hafnium (TDMAHf, Pico Booster).
- Water.
- Aluminum (TMA)
Tool Overview
Responsible: Anders Kvennefors
Location: Room Q246, Aerosol Room (Level 2 - Berseilius Lab)
License and Booking Required: Yes
Documentation
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