Technical information
  • Main application: Deposition thin high-k oxide layers
  • Materials: HfO,ZrO, Al2O3
  • 4" max wafer diameter
  • Sample handling inside nitrogen filled glovebox environment for high quality interfaces.
  • 4 precursors currently installed:
    • Zirconium (TEMAZr, Pico Booster).
    • Hafnium (TDMAHf, Pico Booster).
    • Water.
    • Aluminum (TMA)
Tool Overview

Responsible: Bengt Meuller/ Anders Kvennefors

Location: Room Q246, Aerosol Room (Level 2 - Berseilius Lab)

License and Booking Required: Yes

Documentation

User Manuals

Process

Staff Documents

Other Links

Safety

View on LIMS

FAQ

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