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titleTechnical information
  • E-beam evaporatorMain application: thin film deposition via thermal evaporation
  • Materials available via thermal evaporation: Au, TiAl, Ni, AlNiCr, CrFeNi, Pd, Cu, Zn, Ti, Ge.
  • Materials available via sublimation: Cr and SiO.
  • Tilting and rotation of the substrate is possible.
  • Base pressure below 7x10-7mbar.
  • Maximum wafer size: 62" (150 mm)




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titleTool Overview

Responsible:  David Fitzgerald Johan Stjernholm

Location: Room Q158, EVA-Lab (Level 1)

License and Booking Required: Yes

Tool Summary

  • Location: Insert lab name or room number

  • List main tool capabilites here

    • FAQ

           User Manuals

           Staff Documents



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    titleDocumentation

    User Manuals

    Process

    Staff Documents



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    titleOther Links

    Safety Information

    View on LIMS

    FAQ

    User Discussion Forum