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changes.mady.by.user Anders Kvennefors

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changes.mady.by.user Sarah McKibbin

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titleTechnical information
  • Main application: Deposition thin high-k oxide layers
  • Materials: HfO,ZrO, Al2O3
  • 4" max wafer diameter
  • Sample handling inside nitrogen filled glovebox environment to ensure interface quality and purity.
  • 4 precursors currently installed:
    • Zirconium (TEMAZr, Pico Booster).
    • Hafnium (TDMAHf, Pico Booster).
    • Water.
    • Aluminum (TMA)


Tool Summary

Tool
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titleTool Overview

Responsible: Anders Kvennefors

Location: Room Q246, Aerosol Room (Level 2 - Berseilius Lab)

License and Booking Required: Yes

 

  • Maximum wafer size:4

  • Materials: HfO,ZrO, Al2O3

  • FAQ

    •  


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    titleDocumentation
    Safety

    User Manuals

    Process

    Staff Documents



         
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    titleOther Links

    Safety

    View on LIMS

        

    FAQ