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Responsible: Sarah McKibbin and Alex den Ouden Location: Room Q156, EBL-Lab (Cleanroom Level 1) License and Booking Required: Yes Main application: Resist stripping, isotropic etching Si, SiO2 & SiNx. | |||||||||||||||
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Responsible: Alexander den Ouden Location: Room Q231, CBE-Lab outside cleanroom level 2 License and Booking Required: Yes Main application: planarizing rough sample surfaces, removing thin layers of material |
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User ManualsProcessfor the tool |
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SafetyView on LIMS |