Technical information
- Non-contact direct write lithography.
- Exposure of small pieces and full wafers.
- 6" max wafers or 5" masks
- Lasers: wavelength = 375nm, 405nm.
- 0.8um resolution limit and 500nm alignment accuracy
Tool Overview
Responsible: Sarah McKibbin
Location: Room Q161, UVL-Lab (Cleanroom Level 1)
License and Booking Required: Yes
Documentation
Other Links