• Non-contact direct write lithography.
• Exposure of small pieces and full wafers.
• 6" max wafers or 5" masks
• Lasers: wavelength = 375nm, 405nm.
• 0.8um resolution limit and 500nm alignment accuracy

Responsible: Sarah McKibbin

Location: Room Q161, UVL-Lab (Cleanroom Level 1)

License and Booking Required: Yes

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