Technical information
- Acceleration Voltages: 50 kV.
- Max sample thickness: 3 mm
- 6" Max sample size.
- Minimum resolution: 10 nm.
- Pattern generator speed: 50MHz
- Maximum probe current: 40nA
- 50kV High speed EBL mainly for wafer level exposure.
Tool Overview
Responsible: Anders Kvennefors
Location: Room Q241, New EBL-Lab (Level 2 - Berzelius)
License and Booking Required: Yes
Documentation
1 Comment
Lab Administrator
2021 Feb 08another comment...