• Acceleration Voltages: 50 kV.
• Max sample thickness: 3 mm
• 6" Max sample size.
• Minimum resolution: 10 nm.
• Pattern generator speed: 50MHz
• Maximum probe current: 40nA
• 50kV High speed EBL mainly for wafer level exposure.

Responsible: Anders Kvennefors

Location: Room Q241, New EBL-Lab (Level 2 - Berzelius)

License and Booking Required: Yes

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