Technical information
- Main application: Large area exposure of regular patterns
- Gratings, square or hexagonal dot arrays
- Monochromatic pulsed excimer laser (193nm wavelenth)
- Resolution below 100nm, Maximum pitch approx. 1.5µm.
- 4" max wafer diameter
- Exposure insensitive to uneven surface.
Tool Overview
Responsible: Sungyoun Ju
Location: Room Q2XX, Level 2
License and Booking Required: Yes
Tool Summary
Tool Responsible: Sungyoun Ju
Location:
Maximum wafer size:
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