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Technical information
  • Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelenth) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.


Tool Overview

Responsible: Sarah McKibbin

Location: Room Q241, New EBL-Lab (Level 2 - Berseilius Lab)

License and Booking Required: Yes

Documentation

User Manuals

Process

Staff Documents

Other Links

Safety Information 

View on LIMS

FAQs

User Forum - Option 1 - open page for editing content and comments

User Forum - Option 2 - extra confluence app

User Forum - Option 3 - page tree plus tagging could create a forum like space...




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