Technical information
- Main application: Large area exposure of regular patterns
- Gratings, square or hexagonal dot arrays
- Monochromatic pulsed excimer laser (193nm wavelenth)
- Resolution below 100nm, Maximum pitch approx. 1.5µm.
- 4" max wafer diameter
- Exposure insensitive to uneven surface.
Tool Overview
Responsible: Sarah McKibbin
Location: Room Q241, New EBL-Lab (Level 2 - Berseilius Lab)
License and Booking Required: Yes
Documentation
Other Links