Tool Summary
Tool Responsible: Sarah McKibbin
Location: Q241 (Level 2 - Berzeilius Lab)
License Required: Yes
Booking Compulsory: Yes
Tool Information:
- Monochromatic pulsed excimer laser - class 4
- 193nm exposure
- Resolution below 100nm, estimated maximum pitch approx. 1.5µm.
- 4" max wafer diameter
- Large area exposure of regular patterns
- Gratings, square or hexagonal dot arrays
- Exposure insensitive to uneven surface.
FAQ