Tool Summary
Tool Responsible: Peter Blomqvist & George Rydnemalm
Location: LNL, clean room first floor
License required: Yes
Tool information:
- Available target materials: Au, Ni, Mo, W, Ti, Si, SiO2, TiN, ITO
- 3 DC magnetrons and 2 RF magnetrons
- 4" wafer holder
- Gases: Ar, N2, O2
- Process chamber base pressure: low 10-7 mbar
- QCM (Quartz Micro Balance)
FAQ