• ZEISS LEO - 1560 Scanning Electron Microscope (SEM)
• Schottky field emission gun
• In-lens SE & E-T SE detectors
• Capable of 1nm resolution at 20kV
• Main application: Large area exposure of regular patterns
• Gratings, square or hexagonal dot arrays
• Monochromatic pulsed excimer laser (193nm wavelenth) 
• Resolution below 100nm, Maximum pitch approx. 1.5µm.
• 4" max wafer diameter
• Exposure insensitive to uneven surface.
• loading with the load lock, 6'' max loading through the chamber door

Responsible: Anders Kvennefors Alexander den Ouden & PB

Location: Room Q255, (Level 2)

License and Booking Required: Yes

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