There are a number of characterization characterisation techniques available in and out of the cleanroom laboratories at LNL. This includes measuring the thickness and quality of thin films, imaging via optical and scanning electron microscopy, metrology via atomic force microscopy and scanning probe profilometry and electrical device characterization.Lund Nano Lab.
These include:
- Scanning Electron Microscopes (SEM) for high resolution surface imaging;
- Energy Dispersive X-ray Spectroscopy (EDS) and Electron BackScatter Diffraction (EBSD) for chemical analysis and surface microstructural analysis;
- Atomic Force Microscopy (AFM) for topography, nanomechanical and electrical properties;
- stylus profilometry for quick and easy surface characterisation;
- X-Ray Diffraction (XRD) for characterisation of atomic structure;
- ellipsometry for measuring film thickness and optical properties;
- and several different setups for electrical device characterisation.
Below you find many of the different metrology/characterisation tools available to LNL users.
By clicking on the tools you can access a lot of useful information, such as user manuals, what kind of information one can obtain from the different tools, FAQs, user discussion forums etc.
The metrology/characterisation section is still a work in progress, for suggestions and questions please contact ~ftf-pbo.
