• Main application: Rapid Thermal Processing (RTP) system,
• GasesAvailable gases: N2, O2 or forming gas (20% 5% of H2 + 80% 95% of N2). No vacuum.
• 4" max wafer diameter, wafer carrier available.
• Temperature /time limitations: max 60 min for dependent time limits
  • T < 400°C
  , max 30 min for
  • : 60 min
  • 400°C < T < 600°C
  , max 15 min for
  • : 30 min
  • 600°C < T < 800°C
  , max 5 min for
  • : 15 min
  • 800°C < T < 1000°C
  .
  • : 5 min

• Max temperature ramp up rate is 150°C/s.
• Up to 100 steps programmable processes.

Responsible: Dmitry Suyatin Alexander Den Ouden

Location: Room Q158, EVA-Lab (Cleanroom Level 1)

License and Booking Required: Yes

Model and supplier: RTP-1200-100 from UniTemp GmbH.

User Manuals

Process

Staff Documents

Safety Information

View on LIMS

FAQ