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Raith Voyager EBL system


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titleTechnical information
  • Acceleration Voltages: 50 kV.
  • Max sample thickness: 3 mm
  • 6" Max sample size.
  • Minimum resolution: 10 nm.
  • Pattern generator speed: 50MHz
  • Maximum probe current: 40nA
  • 50kV High speed EBL mainly for wafer level exposure.


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titleTool Overview

Responsible: Anders Kvennefors

Location: Room Q241, New EBL-Lab (Level 2 - Berzelius)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information 

View on LIMS

FAQ

User Discussion Forum