Versions Compared

Old Version 3

changes.mady.by.user Peter Blomqvist

Saved on

compared with

New Version Current

changes.mady.by.user Alexander Den Ouden

Saved on

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.

Image Added







Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTechnical information
  • ZEISS LEO - 1560 Scanning Electron Microscope (SEM)
  • Schottky field emission gun
  • In-lens SE & E-T SE detectors
  • Capable of 1nm resolution at 20kV
  • 4" max wafer diameter loading with the load lock, 6'' max loading through the chamber door


Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTool Overview

Responsible: Alexander den Ouden & PB

Location: Room Q255, (Level 2)

License and Booking Required: Yes


Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleDocumentation
Image Removed

Tool Summary

  • Tool Responsible: Anders Kvennefors

  • Location: 

  • Maximum wafer size: 

  • FAQ

Safety

User Manuals

Process

Staff Documents



     
Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleOther Links

Safety Information

View on LIMS

    

FAQ

User Discussion Forum