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changes.mady.by.user Anders Kvennefors

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changes.mady.by.user Bengt Meuller

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titleTechnical information
  • Main application: Atomic layer deposition of high-k dielectrics
  • Materials: HfO, Al2O3
  • ?" max wafer diameter


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titleTool Overview

Responsible: Bengt Meuller/

Tool Summary

Tool Responsible:

Anders Kvennefors

Location:

 

  • Maximum wafer size: 

  • Materials: HfO, Al2O3

  • FAQ

    • Room Q255, (Level 2)

    License and Booking Required: Yes


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    titleDocumentation
    Safety

    User Manuals

    Process

    Staff Documents



         
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    titleOther Links

    Safety Information

    View on LIMS

        

    FAQ

    User Discussion Forum