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The AIX 200/4 is a system for epitaxial growth of uniform layers of all III-V semiconductors. It can be used in research and development as well as in production
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Responsible: Magnus Borgström & Sungyoun Ju Location: Room Q256, Level 2 License and Booking Required: Yes |
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Tool Summary
Tool Responsible: Sarah Mckibbin
Location: Q241
Maximum wafer size: 4"
FAQ
User ManualsProcessStaff Documents |
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Safety |
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FAQUser Discussion Forum |