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titleTechnical information
  • Main application: Large area exposure of regular patterns
    • Gratings, square or hexagonal dot arrays
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Tool Summary

  • Tool Responsible: Sarah McKibbin

  • Location: Q241 (Level 2 - Berzeilius Lab)

  • License Required: Yes

  • Booking Compulsory: Yes

    • Tool Information:
    • Monochromatic pulsed excimer laser
    - class 4193nm exposure 
    • (193nm wavelength) 
    • Resolution below 100nm,
    estimated maximum
    • Maximum pitch approx. 1.5µm.
    • 4" max wafer diameter
  • Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
    • Exposure insensitive to uneven surface.

  • FAQ


    Panel
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    titleTool Overview

    Responsible: Sarah McKibbin

    Location: Room Q161, UVL-Lab (Cleanroom Level 1)

    License and Booking Required: Yes


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    titleDocumentation
    Safety

    User Manuals

    Process

    Examples

    Staff Documents



         
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    titleOther Links

    Safety Information 

    View on LIMS

        

    FAQs

    User Discussion Forum