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changes.mady.by.user Sarah McKibbin

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titleTechnical information
  • Main application: Large area exposure of regular patterns
    • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelength) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter

  • Gold nano particles for seeding nano wire growth
  • Aerosol research
  • Particle size 3-100nm in electrical mobility diameter (Spherical or agglomerates)
  • Surface density normal 0.5-1.0 #/µm2
  • Exposure insensitive to uneven surface.Max 40mm diameter deposition


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titleTool Overview

Responsible: Sarah McKibbin Bengt Meuller

Location: Room Q241Q246, New EBL-Lab (Level 2 - Berseilius Berzelius Lab)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Examples

Staff Documents



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titleOther Links

Safety Information 

View on LIMS

FAQs

User Discussion Forum


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