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titleTechnical information
  • Main application: Atomic layer deposition of high k dielectrics
  • Materials: HfO, Al2O3
  • ?" max wafer diameter


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titleTool Overview

Responsible: Anders Kvennefors/ George Rydnemalm

Location: Room Q255, (Level 2)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information

View on LIMS

FAQ

User Discussion Forum