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titleTool Overview

Responsible: Bengt Meuller

Location: RoomQ 256

License and Booking Required: Yes

Main application:


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titleTechnical information
  • Main application: Deposition thin high-k oxide layers
  • Materials: HfO, Al2O3
  • 8" max wafer diameter
  • 3 precursors currently installed:
    • Hafnium (TDMAHf, Booster).
    • Water.
    • Aluminum (TMA)



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titleDocumentation

Documents for the tool



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titleOther Links

View on LIMS

FAQ


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