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titleTechnical information
  • Main application: Molecular Vapor Depostion tool for surface modification using self-assembled monolayers and atomic layer deposition.
  • Materials: SiO2, HfO, TiN, Al2O3, AlN
  • 8" max wafer diameter


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titleTool Overview

Responsible: Anders Kvennefors/ George Rydnemalm

Location: Room Q2XXQ258, (Level 2)

License and Booking Required: Yes

    


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information

View on LIMS

FAQ

User Discussion Forum


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