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The AIX 200/4 is a system for epitaxial growth of uniform layers of all III-V semiconductors. It can be used in research and development as well as in production · The horizontal reactor of the AIX 200/4 permits the handling of up to 1 x 4 |
· Flexible and extendable systems with modular set up of components
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· Particle free due to uncoupled rotation |
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Responsible: Magnus Borgström & Sungyoun Ju Location: Room Q256, Level 2 License and Booking Required: Yes |
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User ManualsProcessStaff Documents |
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SafetyView on LIMSFAQUser Discussion Forum |
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