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Old Version 10

changes.mady.by.user Sarah McKibbin

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New Version 11

changes.mady.by.user Alexander Den Ouden

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titleTechnical information
  • Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelenth) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.
  • loading with the load lock, 6'' max loading through the chamber door


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titleTool Overview

Responsible: Anders KvenneforsAlexander den Ouden

Location: Room Q255, (Level 2)

License and Booking Required: Yes


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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information

View on LIMS

FAQ


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