Versions Compared

Old Version 6

changes.mady.by.user Sarah McKibbin

Saved on

compared with

New Version 7

changes.mady.by.user Sarah McKibbin

Saved on

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.





Tool Summary



Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTechnical information
  • Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelenth) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.


Tool
Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTool Overview

Responsible: Sungyoun Ju

Location:

 

  • Maximum wafer size:

  • FAQ

    • Room Q241, New EBL-Lab (Level 2 - Berseilius Lab)

    License and Booking Required: Yes


    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleDocumentation
    Safety

    User Manuals

    Process

    Staff Documents


    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleOther Links

    Staff Documents

         

    View on LIMS

        

    FAQ