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title	Technical information

Main application: Large area exposure of regular patterns
Gratings, square or hexagonal dot arrays
Monochromatic pulsed excimer laser (193nm wavelenth)
Resolution below 100nm, Maximum pitch approx. 1.5µm.
4" max wafer diameter
Exposure insensitive to uneven surface.

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title	Tool Overview

Responsible: Anders Kvennefors

Location: Room Q255, (Level 2)

License and Booking Required: Yes

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title	Documentation

User Manuals

Process

Staff Documents

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title	Other Links

Safety Information

View on LIMS

FAQ