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titleTechnical information
  • Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelenth) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.


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titleTool Overview

Responsible: Anders Kvennefors

Location: Room Q255, (Level 2)

License and Booking Required: Yes

Tool Summary

  • Tool Responsible: Anders Kvennefors

  • Location: LNL Q255

  • License required: Yes 

  • Booking required: Yes

  • FAQ

Safety

User Manuals

Process

Staff Documents

     View on LIMS

    


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titleBGColor#DCE9EE
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titleDocumentation

User Manuals

Process

Staff Documents



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titleOther Links

Safety Information

View on LIMS

FAQ