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  • Main application: Molecular Vapor Depostion tool for surface modification using self-assembled monolayers and atomic layer deposition.

Tool Summary

  • Tool Responsible: Anders Kvennefors

  • Location: 

  • Maximum wafer size: 8
    • Materials: SiO2, HfO, TiN, Al2O3, AlN
  • FAQ

    • 8" max wafer diameter


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    titleTool Overview

    Responsible: Anders Kvennefors

    Location: Room Q2XX, (Level 2)

    License and Booking Required: Yes

        


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    titleDocumentation
    Safety

    User Manuals

    Process

    Staff Documents


         
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    Safety Information

    View on LIMS

        

    FAQ