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Lund Nano Lab
Thin Films
PECVD - MicroSys 200
Page History
Versions Compared
Old Version
15
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 04
compared with
New Version
16
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 05
Previous Change: Difference between versions 14 and 15
Next Change: Difference between versions 16 and 17
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Tool Summary
Tool Responsible:
Peter Blomqvist
& Sungyoun Ju
Location: LNL Q258
License required:
Yes
Booking required:
Yes
Tool information:
Deposition of SiO
2
, Si
3
N
4
and a-Si
FAQ
Safety
User Manuals
Process
Staff Documents
...
Overview
Content Tools
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