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Lund Nano Lab
Thin Films
PECVD - MicroSys 200
Page History
Versions Compared
Old Version
13
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
compared with
New Version
14
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
Previous Change: Difference between versions 12 and 13
Next Change: Difference between versions 14 and 15
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Tool Summary
Tool Responsible:
Peter Blomqvist
& Sungyoun Ju
Location: LNL
Q25X
Q258
License required: Yes
Tool information:
Deposition of SiO
2
, Si
3
N
4
and a-Si
FAQ
Safety
User Manuals
Process
Staff Documents
...
Overview
Content Tools
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