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Lund Nano Lab
Thin Films
PECVD - MicroSys 200
Page History
Versions Compared
Old Version
12
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
compared with
New Version
13
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
Previous Change: Difference between versions 11 and 12
Next Change: Difference between versions 13 and 14
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Tool Summary
Tool Responsible:
Peter Blomqvist
& Sungyoun Ju
Location: LNL Q25X
License required: Yes
Tool information:
Dedicated for deposition
Deposition
of SiO
2
, Si
3
N
4
and a-Si
FAQ
Safety
User Manuals
Process
Staff Documents
...
Overview
Content Tools
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