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Lund Nano Lab
Thin Films
PECVD - MicroSys 200
Page History
Versions Compared
Old Version
9
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
compared with
New Version
10
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
Previous Change: Difference between versions 8 and 9
Next Change: Difference between versions 10 and 11
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Tool Summary
Tool Responsible:
Peter Blomqvist
& Sungyoun Ju
Location: LNL
, 25X
Maximum wafer size:
Q25X
License required: Yes
Tool information:
Materials available: N2
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