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Lund Nano Lab
Thin Films
PECVD - MicroSys 200
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Versions Compared
Old Version
4
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
compared with
New Version
5
changes.mady.by.user
Peter Blomqvist
Saved on
2020 Aug 03
Previous Change: Difference between versions 3 and 4
Next Change: Difference between versions 5 and 6
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Tool Summary
Tool Responsible:
Peter Blomqvist
Location: EVA Lab
Maximum wafer size:
Materials available: N2
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