Tool Summary

• Tool Responsible: Peter Blomqvist & George Rydnemalm

• Location: LNL. clean room first floor

• License required: Yes

• Tool information:

  • Available target materials: Au, Ni, Mo, W, Ti, Si, SiO2, TiN, ITO
  • 3 DC magnetrons and 2 RF magnetrons
  • 4" wafer holder
  • Gases: Ar, N2, O2
  • Process chamber base pressure: low 10^-7 mbarAvailable 

• FAQ

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