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Tool Summary

  • Tool Responsible: Sarah McKibbin

  • Location: Q156 - EBL lab

  • License Required: Yes

  • Booking Compulsory: Yes 

  • Tool Information:

    • Parallel plate RF etcher. 
    • Max Power: 30 W.
    • Min Power: 1 W.
    • Low power descum and residuals removal.
    • 3" max wafer diameter
  • FAQ

Safety

User Manuals

Process

Staff Documents


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