• Main application: Large area exposure of regular patterns
  • Gratings, square or hexagonal dot arrays
• Monochromatic pulsed excimer laser (193nm wavelength) 
• Resolution below 100nm, Maximum pitch approx. 1.5µm.
• 4" max wafer diameter
• Exposure insensitive to uneven surface.

Responsible: Sarah McKibbin

Location: Room Q241, New EBL-Lab (Level 2 - Berseilius Lab)

License and Booking Required: Yes

User Manuals

Process

Examples

Staff Documents

Safety Information 

View on LIMS

FAQs

User Discussion Forum