• Main application: Deposition thin high-k oxide layers
• Materials: HfO,ZrO, Al2O3
• 4" max wafer diameter
• Sample handling inside nitrogen filled glovebox environment for high quality interfaces.
• 4 precursors currently installed:
  • Zirconium (TEMAZr, Pico Booster).
  • Hafnium (TDMAHf, Pico Booster).
  • Water.
  • Aluminum (TMA)

Responsible: Harald Havir / Anders Kvennefors

Location: Room Q246, Aerosol Room (Level 2 - Berseilius Lab)

License and Booking Required: Yes

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