We have several patterning techniques available for fabricating structures from full wafer patterning to sub 10 nm resolution. These include Electron Beam Lithography (EBL), a direct laser writing mask-less aligner, two mask aligners for standard photolithography, as well as non-contact methods for large area patterning; Displacement Talbot lithography (DTL) and Nanoimprint lithography (NIL).
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