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titleTechnical information
  • nonNon-contact direct write lithography.
  • Exposure of small pieces and full wafers.
  • ?6" max wafers .
  • 405nm wavelenth.
  • or 5" masks
  • Lasers: wavelength = 375nm, 405nm.
  • 0.8um resolution limit and 500nm alignment accuracy

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titleTool Overview

Responsible: Sarah McKibbin

Location: Room Q161, EBLUVL-Lab (Cleanroom Level 1)

License and Booking Required: Yes



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titleDocumentation

User Manual

Process

Examples

Staff Documents



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titleOther Links

Safety Information 

View on LIMS

FAQ

User Discussion Forum