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changes.mady.by.user Sarah McKibbin

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titleTechnical information
  • Main application: Large area exposure of regular patterns
    • Gratings, square or hexagonal dot arrays
  • Monochromatic pulsed excimer laser (193nm wavelength) 
  • Resolution below 100nm, Maximum pitch approx. 1.5µm.
  • 4" max wafer diameter
  • Exposure insensitive to uneven surface.


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titleTool Overview

Responsible: Sarah McKibbin

Location: Room Q161, UVL-Lab (Cleanroom Level 1)

License and Booking Required: Yes


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Tool Summary

  • Tool Responsible: Sarah Mckibbin

  • Location: 

  • Maximum wafer size: 

  • FAQ

Safety

User Manuals

Process

Examples

Staff Documents



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Safety Information 

View on LIMS

    

FAQs

User Discussion Forum