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Panel
borderColor#BFB8AF
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titleTool OverviewTechnical information
  • Non-contact direct write lithography.
  • Exposure of small pieces and full wafers.
  • 6" max wafers or 5" masks
  • Lasers: wavelength = 375nm, 405nm.
  • 0.8um resolution limit and 500nm alignment accuracy

Responsible: Sarah McKibbin

Location: Room Q161, EBL-Lab (Cleanroom Level 1)

License and Booking Required: Yes

Main application: Li

Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTechnical informationTool Overview

Responsible: Sarah McKibbin

Location: Room Q161, UVL-Lab (Cleanroom Level 1)

License and Booking Required: Yes



  • non-contact direct write lithography.
  • Exposure of small pieces and full wafers.
  • ?" max wafers.
  • 405nm wavelenth.
Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleDocumentation

User Manual

Process

Examples

Staff Documents

for the tool



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titleOther Links

Safety Information 

View on LIMS

FAQ

User Discussion Forum