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Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTool OverviewTechnical information
  • non-contact direct write lithography.
  • Exposure of small pieces and full wafers.
  • ?" max wafers.
  • 405nm wavelenth.

Responsible: Sarah McKibbin

Location: Room Q161, EBL-Lab (Cleanroom Level 1)

License and Booking Required: Yes

Main application: Li

Panel
borderColor#BFB8AF
bgColorwhite
titleColorBlack
borderWidth2
titleBGColor#DCE9EE
borderStylesolid
titleTechnical informationTool Overview

Responsible: Sarah McKibbin

Location: Room Q161, EBL-Lab (Cleanroom Level 1)

License and Booking Required: Yes

  • non-contact direct write lithography.
  • Exposure of small pieces and full wafers.
  • ?" max wafers.
    • 405nm wavelenth.



    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleDocumentation

    Documents for the tool



    Panel
    borderColor#BFB8AF
    bgColorwhite
    titleColorBlack
    borderWidth2
    titleBGColor#DCE9EE
    borderStylesolid
    titleOther Links

    View on LIMS


    ...